This website uses cookies to give you the best user experience. If you continue
without changing your settings we'll assume you are happy to receive all RSC cookies.
You can change your cookie settings by navigating to our Privacy and Cookies page and following the instructions. These instructions
are also obtainable from the privacy link at the bottom of any RSC page.
School of Engineering and Applied Sciences, Harvard University, 29 Oxford Street, Cambridge, USA
E-mail: nvogel@seas.harvard.edu
b
Flinders Centre for NanoScale Science and Technology, School of Chemical and Physical Sciences, Flinders University, GPO Box 2100, Adelaide, Australia
E-mail: ingo.koeper@flinders.edu.au
Nanoscale, 2012,4, 3820-3832
DOI:
10.1039/C2NR30434A
Received
24 Feb 2012,
Accepted
23 Apr 2012
First published online
25 Apr 2012
In an experimentally simple replica process, the natural flatness of mica or polished silicon wafers can be transferred to metal films, resulting in metal surfaces with topographic features in Angstrom dimensions over large areas. Two decades after its invention, the template-stripping process continues to appeal to scientists from diverse research backgrounds primarily due to its simplicity, cost-effectiveness and ability to yield high quality substrates and structures. This article introduces the basic construction process for template-stripped substrates, and reports on a variety of extensions of the process, including the generation of materials contrasts and the design of tailored topographies. It also highlights the use of such substrates in a variety of research fields in nanoscience and technology ranging from surface force measurement and high definition imaging to the self-assembly of model membranes and plasmonics.
Fetching data from CrossRef. This may take some time to load.