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Influence of the hydrogen contained in amorphous silicon thin films on a pulsed radiofrequency argon glow discharge coupled to time of flight mass spectrometry. Comparison with the addition of hydrogen as discharge gas

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Department of Physical and Analytical Chemistry, Faculty of Chemistry, University of Oviedo, Julian Clavería 8, Oviedo, Spain
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Energy Group (EN)—ITMA Materials Technology, Calafates 11, Avilés, Spain
J. Anal. At. Spectrom., 2012,27, 71-79

DOI: 10.1039/C1JA10235D
Received 08 Aug 2011, Accepted 24 Oct 2011
First published online 22 Nov 2011
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Icon Journal of Analytical Atomic Spectrometry - Information Point