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Issue 35, 2012
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Atomic/molecular layer deposited thin-film alloys of Ti-4,4′-oxydianiline hybrid–TiO2 with tunable properties

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Abstract

By combining atomic layer deposition (ALD) and molecular layer deposition (MLD) thin-film techniques, the latter being a variant of the former in which organic precursors are used, it is possible to deposit thin films containing precisely controlled portions of inorganic and organic constituents. This in turn enables the adjustment of material properties by changing the number of ALD and MLD cycles applied during the deposition. In this work, the properties of such thin-film “alloys” prepared by varying the portions of Ti-4,4′-oxydianiline (Ti-ODA) inorganic–organic hybrid and TiO2 in the structure were investigated. The films were deposited at 280 °C using TiCl4 and water as precursors for TiO2, and TiCl4 and ODA for the Ti-ODA hybrid. The results demonstrate excellent tunability of the film properties such as degree of crystallinity, roughness, refractive index, and hardness depending on the relative number of TiO2 and Ti-ODA cycles employed.

Graphical abstract: Atomic/molecular layer deposited thin-film alloys of Ti-4,4′-oxydianiline hybrid–TiO2 with tunable properties

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Publication details

The article was received on 10 May 2012, accepted on 09 Jul 2012, published on 16 Jul 2012 and first published online on 16 Jul 2012


Article type: Paper
DOI: 10.1039/C2DT31026K
Citation: Dalton Trans., 2012,41, 10731-10739
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    Atomic/molecular layer deposited thin-film alloys of Ti-4,4′-oxydianiline hybrid–TiO2 with tunable properties

    P. Sundberg, A. Sood, X. Liu, L. Johansson and M. Karppinen, Dalton Trans., 2012, 41, 10731
    DOI: 10.1039/C2DT31026K

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