Issue 41, 2012

Improved ambient operation of n-channel organic transistors of solution-sheared naphthalene diimide under bias stress

Abstract

Large arrays of n-channel organic thin film transistors of a core-chlorinated naphthalene diimide were processed by solution shearing on a silicon dioxide dielectric exhibiting ambient stable electron mobilities of up to 0.95 cm2 V−1 s−1. Under bias stress an increase in effective charge carrier mobility of up to 4.26 cm2 V−1 s−1 has been observed.

Graphical abstract: Improved ambient operation of n-channel organic transistors of solution-sheared naphthalene diimide under bias stress

Supplementary files

Article information

Article type
Communication
Submitted
14 May 2012
Accepted
25 Jun 2012
First published
13 Jul 2012

Phys. Chem. Chem. Phys., 2012,14, 14181-14185

Improved ambient operation of n-channel organic transistors of solution-sheared naphthalene diimide under bias stress

M. Stolte, M. Gsänger, R. Hofmockel, S. Suraru and F. Würthner, Phys. Chem. Chem. Phys., 2012, 14, 14181 DOI: 10.1039/C2CP41552F

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