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Issue 19, 2012
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Incorporation of Mo and W into nanostructured BiVO4 films for efficient photoelectrochemical water oxidation

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Abstract

Porous, nanostructured BiVO4 films are incorporated with Mo and W by simultaneous evaporation of Bi, V, Mo, and W in vacuum followed by oxidation in air. Synthesis parameters such as the Bi : V : Mo : W atomic ratio and deposition angle are adjusted to optimize the films for photoelectrochemical (PEC) water oxidation. Films synthesized with a Bi : V : Mo : W atomic ratio of 46 : 46 : 6 : 2 (6% Mo, 2% W) demonstrate the best PEC performance with photocurrent densities 10 times higher than for pure BiVO4 and greater than previously reported for Mo and W containing BiVO4. The films consist of a directional, nanocolumnar layer beneath an irregular surface structure. Backside illumination utilizes light scattering off the irregular surface structure resulting in 30–45% higher photocurrent densities than for frontside illumination. To improve the kinetics for water oxidation Pt is photo-deposited onto the surface of the 6% Mo, 2% W BiVO4 films as an electrocatalyst. These films achieve quantum efficiencies of 37% at 1.1 V vs. RHE and 50% at 1.6 V vs. RHE for 450 nm light.

Graphical abstract: Incorporation of Mo and W into nanostructured BiVO4 films for efficient photoelectrochemical water oxidation

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Publication details

The article was received on 14 Mar 2012, accepted on 14 Mar 2012 and first published on 23 Mar 2012


Article type: Paper
DOI: 10.1039/C2CP40807D
Citation: Phys. Chem. Chem. Phys., 2012,14, 7065-7075
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    Incorporation of Mo and W into nanostructured BiVO4 films for efficient photoelectrochemical water oxidation

    S. P. Berglund, A. J. E. Rettie, S. Hoang and C. B. Mullins, Phys. Chem. Chem. Phys., 2012, 14, 7065
    DOI: 10.1039/C2CP40807D

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