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Paper

Considerations on ultra-high frequency electric field effects on oxygen vacancy concentration in oxide thin films

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Corresponding authors
a
Center for Nanoscale Materials, Argonne National Laboratory, Argonne, USA
E-mail: skrssank@anl.gov
b
Nuclear Engineering Division Argonne National Laboratory, Argonne, USA
c
Harvard School of Engineering and Applied Sciences, Harvard University, Cambridge, USA
Phys. Chem. Chem. Phys., 2012,14, 3360-3368

DOI: 10.1039/C2CP22696K
Received 22 Aug 2011, Accepted 04 Jan 2012
First published online 02 Feb 2012
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