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Considerations on ultra-high frequency electric field effects on oxygen vacancy concentration in oxide thin films

Corresponding authors
Center for Nanoscale Materials, Argonne National Laboratory, Argonne, USA
Nuclear Engineering Division Argonne National Laboratory, Argonne, USA
Harvard School of Engineering and Applied Sciences, Harvard University, Cambridge, USA
Phys. Chem. Chem. Phys., 2012,14, 3360-3368

DOI: 10.1039/C2CP22696K
Received 22 Aug 2011, Accepted 04 Jan 2012
First published online 02 Feb 2012
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