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Issue 78, 2012
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Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

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Abstract

Block copolymer nanolithography has been extended to the nanopatterning of organic functionalities on pyrolyzed photoresist carbon films (PPFs) via diazonium chemistry, using PS-b-P4VP as the template.

Graphical abstract: Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

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Publication details

The article was received on 13 Jul 2012, accepted on 14 Aug 2012 and first published on 15 Aug 2012


Article type: Communication
DOI: 10.1039/C2CC35010F
Citation: Chem. Commun., 2012,48, 9741-9743
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    Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

    X. Deng, J. M. Buriak, P. Dai, L. Wan and D. Wang, Chem. Commun., 2012, 48, 9741
    DOI: 10.1039/C2CC35010F

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