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Issue 60, 2012
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Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography

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Abstract

For the first time a top-down process was used to control the spatial location of Metal–Organic Frameworks on a surface. Deep X-ray lithography was utilised to micropattern a Zeolitic Imidazolate Framework layer on a sol–gel surface, with exposure hardening the sol–gel by inducing crosslinking while leaving the frameworks intact.

Graphical abstract: Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography

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Publication details

The article was received on 08 May 2012, accepted on 31 May 2012 and first published on 08 Jun 2012


Article type: Communication
DOI: 10.1039/C2CC33292B
Citation: Chem. Commun., 2012,48, 7483-7485
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    Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography

    C. Dimitrakakis, B. Marmiroli, H. Amenitsch, L. Malfatti, P. Innocenzi, G. Grenci, L. Vaccari, A. J. Hill, B. P. Ladewig, M. R. Hill and P. Falcaro, Chem. Commun., 2012, 48, 7483
    DOI: 10.1039/C2CC33292B

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