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1,5-Migration of rhodium via C–H bond activation in catalytic decyanative silylation of nitriles

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Corresponding authors
a
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Japan
E-mail: tobisu@chem.eng.osaka-u.ac.jp
b
Department of Applied Chemistry, Faculty of Engineering, Osaka University, Suita, Japan
E-mail: chatani@chem.eng.osaka-u.ac.jp
Chem. Commun., 2012,48, 11437-11439

DOI: 10.1039/C2CC36601K
Received 11 Sep 2012, Accepted 10 Oct 2012
First published online 11 Oct 2012
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