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Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

Corresponding authors
Key Laboratory of Molecular Nanostructure and Nanotechnology, Institute of Chemistry, the Chinese Academy of Sciences, and Beijing National Laboratory for Molecular Sciences, Beijing 100190, China
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Graduate University of the Chinese Academy of Sciences, China
National Institute for Nanotechnology, and the Department of Chemistry, University of Alberta, Edmonton, Alberta, Canada
Chem. Commun., 2012,48, 9741-9743

DOI: 10.1039/C2CC35010F
Received 13 Jul 2012, Accepted 14 Aug 2012
First published online 15 Aug 2012
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