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Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

Xin Deng,ab   Jillian M. Buriak,c   Pei-Xia Dai,a   Li-Jun Wana and   Dong Wang*a  
Corresponding authors
Key Laboratory of Molecular Nanostructure and Nanotechnology, Institute of Chemistry, the Chinese Academy of Sciences, and Beijing National Laboratory for Molecular Sciences, Beijing 100190, China
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Graduate University of the Chinese Academy of Sciences, China
National Institute for Nanotechnology, and the Department of Chemistry, University of Alberta, Edmonton, Alberta, Canada
Chem. Commun., 2012,48, 9741-9743

DOI: 10.1039/C2CC35010F
Received 13 Jul 2012, Accepted 14 Aug 2012
First published online 15 Aug 2012
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