Block copolymer nanolithography has been extended to the nanopatterning of organic functionalities on pyrolyzed photoresist carbon films (PPFs) via diazonium chemistry, using PS-b-P4VP as the template.
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Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films
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a
Key Laboratory of Molecular Nanostructure and Nanotechnology, Institute of Chemistry, the Chinese Academy of Sciences, and Beijing National Laboratory for Molecular Sciences, Beijing 100190, China
E-mail: wangd@iccas.ac.cn ;
Fax: +86-10-62558934 ;
Tel: +86-10-62558934
E-mail: wangd@iccas.ac.cn ;
Fax: +86-10-62558934 ;
Tel: +86-10-62558934
b
Graduate University of the Chinese Academy of Sciences, China
c
National Institute for Nanotechnology, and the Department of Chemistry, University of Alberta, Edmonton, Alberta, Canada
Chem. Commun., 2012,48, 9741-9743
DOI: 10.1039/C2CC35010F
Received 13 Jul 2012, Accepted 14 Aug 2012
First published online 15 Aug 2012
Chemical Communications
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