Vacuum soft lithography to direct neuronal polarization

J. Tanner Nevill; Alexander Mo; Branden J. Cord; Theo D. Palmer; Mu-ming Poo; Luke P. Lee; Sarah C. Heilshorn

doi:10.1039/C0SM00869A

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Soft Matter

Issue 2, 2011

Where physics meets chemistry meets biology for fundamental soft matter research.

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Vacuum soft lithography to direct neuronal polarization

J. Tanner Nevill,^a Alexander Mo,^b Branden J. Cord,^c Theo D. Palmer,^c Mu-ming Poo,^d Luke P. Lee^a and Sarah C. Heilshorn*^b

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Biomolecular Nanotechnology Center, Berkeley Sensor and Actuator Center, Department of Bioengineering, University of California, Berkeley, USA

Department of Materials Science and Engineering, Stanford University, Stanford, USA
E-mail: heilshorn@stanford.edu

Department of Neurosurgery, Stanford University School of Medicine, Stanford, USA

Department of Molecular & Cell Biology, University of California, Berkeley, USA

Soft Matter, 2011,7, 343-347

DOI: 10.1039/C0SM00869A
Received 27 Aug 2010, Accepted 04 Oct 2010
First published online 25 Oct 2010

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The ability to coat surfaces with pre-determined patterns of biomolecules by soft lithography has found use in areas ranging from fundamental biology to translational medicine, such as tissue engineering and diagnostics. However, existing surface patterning techniques (e.g., microcontact printing and traditional lithography) are unable to pattern several biomolecules in a single step. Here we introduce a simple method to simultaneously pattern multiple biomolecules in complex two-dimensional configurations onto substrates with better than 2 µm resolution. This protocol, termed vacuum soft lithography, utilized below ambient pressures temporarily stored within a removable microfluidic template to expose specific regions of a substrate to multiple biochemical solutions. We demonstrate the utility of this vacuum soft lithography technique by fabricating a multi-component array that directs the adhesion, polarization, and neurite guidance of primary hippocampal neurons.

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Detailed methods and additional pattern geometries
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J. Tanner Nevill
Alexander Mo
Branden J. Cord
Theo D. Palmer
Mu-ming Poo
Luke P. Lee
Sarah C. Heilshorn

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