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Issue 7, 2011
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Simple, robust molecular self-assembly on germanium

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Abstract

We report the facile fabrication of high-quality, robust alkanethiolate self-assembled monolayers (SAMs) on germanium substrates. Our approach to produce SAMs on technologically important substrates takes advantage of the many strategies previously developed for gold-thiol self-assembly. Direct self-assembly of alkanethiols on germanium is impeded by the presence of the native germanium oxide. Using a mixture of water and ethanol, we create an environment where both adsorbate and oxide are sufficiently soluble to enable SAM deposition in a single step. By manipulating reaction conditions, monolayers form spontaneously on untreated germanium, which opens new avenues for the exploitation of self-assembly on semiconductor surfaces. While our analyses initially focused on 1-dodecanethiol on Ge(100), this method is robust and we have extended its use to include a range of adsorbates on Ge(100) as well as to the Ge(111) and Ge(110) substrates.

Graphical abstract: Simple, robust molecular self-assembly on germanium

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Publication details

The article was received on 27 Feb 2011, accepted on 05 Apr 2011 and first published on 05 May 2011


Article type: Edge Article
DOI: 10.1039/C1SC00115A
Citation: Chem. Sci., 2011,2, 1334-1343
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    Simple, robust molecular self-assembly on germanium

    J. N. Hohman, M. Kim, H. R. Bednar, J. A. Lawrence, P. D. McClanahan and P. S. Weiss, Chem. Sci., 2011, 2, 1334
    DOI: 10.1039/C1SC00115A

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