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Issue 10, 2011
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Poly(N-protected ethylene imine-alt-ethylene sulfide) block to functionalize polymeric materials

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Abstract

Poly(N-tosyl-ethylene imine-alt-ethylene sulfide) has been synthesized by thiol-ene photopolymerization between N,N-bis(2-mercaptoethyl)-4-methylbenzenesulfonamide and 4-methyl-N,N-divinylbenzenesulfonamide. Its weight-average molecular weight was determined by static light scattering to be 2.8 × 104. The alternating copolymer has –SH and –CH=CH2 end groups and exhibits high solubility in common organic solvents such as chloroform, tetrahydrofuran, acetone, and dimethyl sulfoxide. The N-tosylated copolymer was deprotected to yield poly(ethylene imine-alt-ethylene sulfide), which is fully soluble in dimethyl sulfoxide, acetic acid, and ethanol. Both N-tosylated and deprotected polymers are hydrophobic, and the former and latter polymers are thermally decomposed at 272 and 244 °C, respectively.

Graphical abstract: Poly(N-protected ethylene imine-alt-ethylene sulfide) block to functionalize polymeric materials

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Publication details

The article was received on 10 Jun 2011, accepted on 13 Jul 2011 and first published on 11 Aug 2011


Article type: Communication
DOI: 10.1039/C1PY00264C
Citation: Polym. Chem., 2011,2, 2183-2185
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    Poly(N-protected ethylene imine-alt-ethylene sulfide) block to functionalize polymeric materials

    Y. Hori, N. Pei, R. Kumagai and Y. Sasanuma, Polym. Chem., 2011, 2, 2183
    DOI: 10.1039/C1PY00264C

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