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Issue 11, 2011
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Silicon nanowire arrays-induced graphene oxide reduction under UV irradiation

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Abstract

This paper reports on efficient UV irradiation-induced reduction of exfoliated graphene oxide. Direct illumination of an aqueous solution of graphene oxide at λ = 312 nm for 6 h resulted in the formation of graphene nanosheets dispersible in water. X-Ray photoelectron spectroscopy (XPS), UV-vis spectroscopy, atomic force microscopy (AFM) and electrochemical measurements (cyclic voltammetry and electrochemical impedance spectroscopy) suggest a restoration of the sp2carbon network. The results were compared with graphene nanosheets prepared by photochemical irradiation of a GO aqueous solution in the presence of hydrogenated silicon nanowire (SiNW) arrays or silicon nanowire arrays decorated with silver (SiNW/Ag NPs) or copper nanoparticles (SiNW/Cu NPs). Graphene nanosheets obtained by illumination of the GO aqueous solution at 312 nm for 6 h in the presence of SiNW/Cu NPs exhibited superior electrochemical charge transfer characteristics. This is mainly due to the higher amount of sp2-hybridized carbon in these graphene sheets found by XPS analysis. The high level of extended conjugated carbon network was also evident by the water insoluble nature of the resulting graphene nanosheets, which precipitated upon photochemical reduction.

Graphical abstract: Silicon nanowire arrays-induced graphene oxide reduction under UV irradiation

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Publication details

The article was received on 29 Jul 2011, accepted on 22 Aug 2011 and first published on 29 Sep 2011


Article type: Paper
DOI: 10.1039/C1NR10970G
Citation: Nanoscale, 2011,3, 4662-4669
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    Silicon nanowire arrays-induced graphene oxide reduction under UV irradiation

    O. Fellahi, M. R. Das, Y. Coffinier, S. Szunerits, T. Hadjersi, M. Maamache and R. Boukherroub, Nanoscale, 2011, 3, 4662
    DOI: 10.1039/C1NR10970G

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