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Paper

Silicon nanowire arrays-induced graphene oxide reduction under UV irradiation

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Corresponding authors
a
Institut de Recherche Interdisciplinaire (IRI, USR-3078), Université de Lille1, Parc de la Haute Borne, 50 avenue de Halley, BP 70478, Villeneuve d'Ascq, France
E-mail: rabah.boukherroub@iri.univ-lille1.fr
Fax: +33 3 62 53 17 01
Tel: +33 3 62 53 17 24
b
Institut d'Electronique, de Microélectronique et de Nanotechnologie (IEMN), UMR-CNRS 8520, Cité Scientifique, Villeneuve d'Ascq, France
c
Unité de Développement de la Technologie du Silicium (UDTS), 2, Bd. Frantz Fanon, B.P. 140 Alger-7 merveilles, Algiers, Algeria
d
Materials Science Division, North East Institute of Science and Technology (NEIST), CSIR, Jorhat, India
e
Laboratoire de Physique Quantique et Systèmes Dynamiques, Département de Physique, Université de Sétif, Sétif, Algeria
Nanoscale, 2011,3, 4662-4669

DOI: 10.1039/C1NR10970G
Received 29 Jul 2011, Accepted 22 Aug 2011
First published online 29 Sep 2011
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