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Issue 8, 2011
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In situ self-assembly of mild chemical reduction graphene for three-dimensional architectures

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Abstract

Three-dimensional (3D) architectures of graphene are of interest in applications in electronics, catalysis devices, and sensors. However, it is still a challenge to fabricate macroscopic all-graphene 3D architectures under mild conditions. Here, a simple method for the preparation of 3D architectures of graphene is developed via the in situself-assembly of graphene prepared by mild chemical reduction at 95 °C under atmospheric pressure without stirring. No chemical or physical cross-linkers or high pressures are required. The reducing agents include NaHSO3, Na2S, Vitamin C, HI, and hydroquinone. Both graphene hydrogels and aerogels can be prepared by this method, and the shapes of the 3D architectures can be controlled by changing the type of reactor. The 3D architectures of graphene have low densities, high mechanical properties, thermal stability, high electrical conductivity, and high specific capacitance, which make them candidates for potential applications in supercapacitors, hydrogen storage and as supports for catalysts.

Graphical abstract: In situ self-assembly of mild chemical reduction graphene for three-dimensional architectures

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Publication details

The article was received on 08 Apr 2011, accepted on 22 Apr 2011 and first published on 23 Jun 2011


Article type: Paper
DOI: 10.1039/C1NR10355E
Citation: Nanoscale, 2011,3, 3132-3137
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    In situ self-assembly of mild chemical reduction graphene for three-dimensional architectures

    W. Chen and L. Yan, Nanoscale, 2011, 3, 3132
    DOI: 10.1039/C1NR10355E

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