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A new reducing agent to prepare single-layer, high-quality reduced graphene oxide for device applications

Shun Mao,a   Kehan Yu,a   Shumao Cui,a   Zheng Bo,a   Ganhua Lua and   Junhong Chen*a  
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a
Department of Mechanical Engineering, University of Wisconsin-Milwaukee, 3200 N Cramer Street, Milwaukee, USA
E-mail: jhchen@uwm.edu;
Fax: +1-414-229-6958 ;
Tel: +1-414-229-2615
Nanoscale, 2011,3, 2849-2853

DOI: 10.1039/C1NR10270B
Received 14 Mar 2011, Accepted 16 May 2011
First published online 15 Jun 2011
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