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Issue 7, 2011
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100 mm dynamic stencils pattern sub-micrometre structures

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Abstract

Dynamic stencil lithography uses a moving shadow-mask to draw patterns by having directionally evaporated material deposited through the stencil apertures onto the substrate. Sub-micrometre, two-dimensional patterning is demonstrated at full 100 mm wafer scale, with two examples emphasizing this technique's unique features. Structures having a width-modulated height below a certain aperture size are fabricated by moving the stencil according to a two-dimensional trajectory. Variable-period gratings are obtained by translating a row of apertures at different orientations with respect to the row's axis. Despite the long deposition sequences one could envision for a stencil in dynamic mode, the apertures' active life-time in the sub-micrometre domain remains limited by the material's accretion on the membrane, resulting in the eventual clogging of the openings. A novel solution to this problem containing a micro-heater embedded in the membrane is described and its effectiveness in preventing material from clogging the apertures is demonstrated.

Graphical abstract: 100 mm dynamic stencils pattern sub-micrometre structures

  • This article is part of the themed collection: Lithography
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Publication details

The article was received on 21 Jan 2011, accepted on 06 May 2011, published on 15 Jun 2011 and first published online on 15 Jun 2011


Article type: Paper
DOI: 10.1039/C1NR10083A
Citation: Nanoscale, 2011,3, 2739-2742
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    100 mm dynamic stencils pattern sub-micrometre structures

    V. Savu, S. Xie and J. Brugger, Nanoscale, 2011, 3, 2739
    DOI: 10.1039/C1NR10083A

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