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Focused laser spike (FLaSk) annealing of photoactivated chemically amplified resists for rapid hierarchical patterning

Corresponding authors
Department Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, USA
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Institute for Soldier Nanotechnologies, Massachusetts Institute of Technology, Cambridge, USA
Nanoscale, 2011,3, 2730-2738

DOI: 10.1039/C1NR10050E
Received 15 Jan 2011, Accepted 20 Mar 2011
First published online 18 Apr 2011

This article is part of themed collection: Lithography
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