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Issue 6, 2011
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Large area nanopatterning of alkylphosphonate self-assembled monolayers on titanium oxide surfaces by interferometric lithography

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Abstract

We demonstrate that interferometric lithography offers a fast, simple route to nanostructured self-assembled monolayers of alkylphosphonates on the native oxide of titanium. Exposure at 244 nm using a Lloyd's mirror interferometer caused the spatially periodic photocatalytic degradation of the adsorbates, yielding nanopatterns that extended over square centimetre areas. Exposed regions were re-functionalised by a second, contrasting alkylphosphonate, and the resulting patterns were used as templates for the assembly of molecular nanostructures; we demonstrate the fabrication of lines of polymer nanoparticles 46 nm wide. Nanopatterned monolayers were also employed as resists for etching of the metal film. Wires were formed with widths that could be varied between 46 and 126 nm simply by changing the exposure time. Square arrays of Ti dots as small as 35 nm (λ/7) were fabricated using two orthogonal exposures followed by wet etching.

Graphical abstract: Large area nanopatterning of alkylphosphonate self-assembled monolayers on titanium oxide surfaces by interferometric lithography

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Publication details

The article was received on 16 Dec 2010, accepted on 17 Feb 2011 and first published on 23 Mar 2011


Article type: Paper
DOI: 10.1039/C0NR00994F
Citation: Nanoscale, 2011,3, 2511-2516
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    Large area nanopatterning of alkylphosphonate self-assembled monolayers on titanium oxide surfaces by interferometric lithography

    G. Tizazu, O. El-Zubir, S. R. J. Brueck, D. G. Lidzey, G. J. Leggett and G. P. Lopez, Nanoscale, 2011, 3, 2511
    DOI: 10.1039/C0NR00994F

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