Etch resistance of two commonly used
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Journal of Materials Chemistry was published between 1991 and 2012. From issue 1, 2013, it was replaced by three new journals: Journal of Materials Chemistry A, B and C
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Enhanced polymeric lithography resists via sequential infiltration synthesis
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a
Argonne National Laboratory, Center for Nanoscale Materials, 9700 South Cass Avenue, Argonne, USA
E-mail: darling@anl.gov ;
Fax: +630-252-4646 ;
Tel: +630-252-4580
E-mail: darling@anl.gov ;
Fax: +630-252-4646 ;
Tel: +630-252-4580
b
Argonne National Laboratory, Energy Systems Division, 9700 South Cass Avenue, Argonne, USA
J. Mater. Chem., 2011,21, 11722-11725
DOI: 10.1039/C1JM12461G
Received 31 May 2011, Accepted 22 Jun 2011
First published online 06 Jul 2011
Journal of Materials Chemistry
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