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Issue 37, 2011
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Formation of hierarchical silica nanochannels through nanoimprint lithography

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Abstract

Hierarchically structured silica nanochannels were fabricated through the combination of supercritical carbon dioxide mediated silica deposition and nanoimprint lithography of a sacrificial polymer template. Highly-ordered mesoporous silica was prepared with either spherical or cylindrical domain level features, ∼5–6 nm in diameter, to compliment the device level structure of the embedded nanochannels. The hierarchical structure was used as a test device for low-k dielectric materials with a dielectric constant of 2.0 observed.

Graphical abstract: Formation of hierarchical silica nanochannels through nanoimprint lithography

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Publication details

The article was received on 08 Apr 2011, accepted on 01 Jul 2011 and first published on 02 Aug 2011


Article type: Paper
DOI: 10.1039/C1JM11493J
Citation: J. Mater. Chem., 2011,21, 14213-14218
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    Formation of hierarchical silica nanochannels through nanoimprint lithography

    N. R. Hendricks, J. J. Watkins and K. R. Carter, J. Mater. Chem., 2011, 21, 14213
    DOI: 10.1039/C1JM11493J

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