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Issue 42, 2011
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Direct patterning of quantum dot nanostructuresviaelectron beam lithography

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Abstract

Patterned quantum dot (QD) nanostructures were prepared by direct electron beam lithography on QD films. Time resolved photoluminescence measurements show that the optical properties of these QDs were retained after cross-linking.

Graphical abstract: Direct patterning of quantum dot nanostructuresviaelectron beam lithography

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Publication details

The article was received on 22 Apr 2011, accepted on 08 Jul 2011 and first published on 25 Jul 2011


Article type: Communication
DOI: 10.1039/C1JM11782C
Citation: J. Mater. Chem., 2011,21, 16859-16862
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    Direct patterning of quantum dot nanostructuresviaelectron beam lithography

    V. Nandwana, C. Subramani, Y. Yeh, B. Yang, S. Dickert, M. D. Barnes, M. T. Tuominen and V. M. Rotello, J. Mater. Chem., 2011, 21, 16859
    DOI: 10.1039/C1JM11782C

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