Issue 9, 2011

Cryogenic plasmas for controlled processing of nanoporous materials

Abstract

Plasma processing at cryogenic temperatures tremendously suppresses the depth penetration of plasma radical species within nanoporous materials. We demonstrate that this confining effect is surprisingly unrelated to changes in the phase diffusivity of radical species gas, but is determined by the increase of the sticking coefficient and the radical recombination and reaction factors, favoring an early irreversible surface adsorption of the plasma radical species.

Graphical abstract: Cryogenic plasmas for controlled processing of nanoporous materials

Supplementary files

Article information

Article type
Communication
Submitted
25 Nov 2010
Accepted
06 Jan 2011
First published
24 Jan 2011

Phys. Chem. Chem. Phys., 2011,13, 3634-3637

Cryogenic plasmas for controlled processing of nanoporous materials

F. Iacopi, J. H. Choi, K. Terashima, P. M. Rice and G. Dubois, Phys. Chem. Chem. Phys., 2011, 13, 3634 DOI: 10.1039/C0CP02660C

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