Jump to main content
Jump to site search
PLANNED MAINTENANCE Close the message box

Scheduled maintenance upgrade on Thursday 4th of May 2017 from 8.00am to 9.00am (BST).

During this time our websites will be offline temporarily. If you have any questions please use the feedback button on this page. We apologise for any inconvenience this might cause and thank you for your patience.


Issue 9, 2011
Previous Article Next Article

Cryogenic plasmas for controlled processing of nanoporous materials

Author affiliations

Abstract

Plasma processing at cryogenic temperatures tremendously suppresses the depth penetration of plasma radical species within nanoporous materials. We demonstrate that this confining effect is surprisingly unrelated to changes in the phase diffusivity of radical species gas, but is determined by the increase of the sticking coefficient and the radical recombination and reaction factors, favoring an early irreversible surface adsorption of the plasma radical species.

Graphical abstract: Cryogenic plasmas for controlled processing of nanoporous materials

Back to tab navigation
Please wait while Download options loads

Supplementary files

Publication details

The article was received on 25 Nov 2010, accepted on 06 Jan 2011 and first published on 24 Jan 2011


Article type: Communication
DOI: 10.1039/C0CP02660C
Citation: Phys. Chem. Chem. Phys., 2011,13, 3634-3637
  •   Request permissions

    Cryogenic plasmas for controlled processing of nanoporous materials

    F. Iacopi, J. H. Choi, K. Terashima, P. M. Rice and G. Dubois, Phys. Chem. Chem. Phys., 2011, 13, 3634
    DOI: 10.1039/C0CP02660C

Search articles by author