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Issue 9, 2011
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Cryogenic plasmas for controlled processing of nanoporous materials

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Abstract

Plasma processing at cryogenic temperatures tremendously suppresses the depth penetration of plasma radical species within nanoporous materials. We demonstrate that this confining effect is surprisingly unrelated to changes in the phase diffusivity of radical species gas, but is determined by the increase of the sticking coefficient and the radical recombination and reaction factors, favoring an early irreversible surface adsorption of the plasma radical species.

Graphical abstract: Cryogenic plasmas for controlled processing of nanoporous materials

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Publication details

The article was received on 25 Nov 2010, accepted on 06 Jan 2011 and first published on 24 Jan 2011


Article type: Communication
DOI: 10.1039/C0CP02660C
Citation: Phys. Chem. Chem. Phys., 2011,13, 3634-3637
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    Cryogenic plasmas for controlled processing of nanoporous materials

    F. Iacopi, J. H. Choi, K. Terashima, P. M. Rice and G. Dubois, Phys. Chem. Chem. Phys., 2011, 13, 3634
    DOI: 10.1039/C0CP02660C

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