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Paper

Redox chemistry in thin layers of organometallic complexes prepared using ion soft landing

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Corresponding authors
a
Department of Physics, National Dong Hwa University, Hualien, 974, Taiwan, Republic of China
b
Chemical and Materials Sciences Division, Pacific Northwest National Laboratory, Richland, USA
E-mail: Julia.Laskin@pnl.gov
c
Department of Chemistry and Center for Analytical Instrumentation Development, Purdue University, 560 Oval Drive, West Lafayette, USA
E-mail: cooks@purdue.edu
Phys. Chem. Chem. Phys., 2011,13, 267-275

DOI: 10.1039/C0CP01457E
Received 09 Aug 2010, Accepted 11 Oct 2010
First published online 12 Nov 2010
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