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Redox chemistry in thin layers of organometallic complexes prepared using ion soft landing

Corresponding authors
Department of Physics, National Dong Hwa University, Hualien, 974, Taiwan, Republic of China
Chemical and Materials Sciences Division, Pacific Northwest National Laboratory, Richland, USA
Department of Chemistry and Center for Analytical Instrumentation Development, Purdue University, 560 Oval Drive, West Lafayette, USA
Phys. Chem. Chem. Phys., 2011,13, 267-275

DOI: 10.1039/C0CP01457E
Received 09 Aug 2010, Accepted 11 Oct 2010
First published online 12 Nov 2010
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