Electrodeposition of Cu2O films and their photoelectrochemical properties

Wenyan Zhao; Wuyou Fu; Haibin Yang; Chuanjin Tian; Minghui Li; Yixing Li; Lina Zhang; Yongming Sui; Xiaoming Zhou; Hui Chen; Guangtian Zou

doi:10.1039/C0CE00829J

Electrodeposition of Cu₂O films and their photoelectrochemical properties†

Wenyan Zhao,^a Wuyou Fu,^a Haibin Yang,*^a Chuanjin Tian,^b Minghui Li,^a Yixing Li,^a Lina Zhang,^a Yongming Sui,^a Xiaoming Zhou,^a Hui Chen^a and Guangtian Zou^a

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* Corresponding authors

^a State Key Laboratory of Superhard Materials, Jilin University, Changchun, P.R. China
E-mail: yanghb@jlu.edu.cn
Fax: +86 431 85168763
Tel: +86 431 8516876

^b Institute of Atomic and Molecular Physics, Jilin University, Changchun, P. R. China

Abstract

Well-defined cuprous oxide (Cu₂O) thin film electrodes were electrodeposited on indium-doped tin oxide (ITO) substrates from a slightly acidic Cu(II) acetate solution. The morphologies of Cu₂O film were tunable by altering the deposition potential, reaction time, solution temperature and the NaCl concentration. In particular, the Cu₂O morphologies evolved from dendritic branching to cube-like with the increasing of the NaCl concentration. A growth mechanism was proposed according to the experimental results. In addition, a photocurrent of 0.06 mA cm⁻², an open-circuit photovoltage (V_oc) of 0.38 V, and a significant energy conversation efficiency of 0.01% were obtained under 100 mW cm⁻² UV-visible illumination of the dendritic Cu₂O thin film.

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Electrodeposition of Cu₂O films and their photoelectrochemical properties†

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Electrodeposition of Cu₂O films and their photoelectrochemical properties

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