Issue 2, 2011

Fabrication of monolithic 3D micro-systems

Abstract

This article describes a method and platform for fast prototyping of monolithic 3D microstructures, capable of producing arbitrary positive, negative and suspended 3D geometries, as well as sealed spaces and aligned 3D geometries using standard photoresists and few fabrication steps. Here a microfabrication method employing a mask-less micro-projection lithography platform, which co-exists on a routine fluorescence microscope, has been refined to produce a variety of 3D microstructures with up to 5 µm spatial resolutions and 10 : 1 aspect ratios, as well as its integration within macroscopic areas of several millimetres with up to 30 µm spatial resolutions.

Graphical abstract: Fabrication of monolithic 3D micro-systems

Supplementary files

Article information

Article type
Paper
Submitted
24 Aug 2010
Accepted
14 Oct 2010
First published
02 Nov 2010

Lab Chip, 2011,11, 288-295

Fabrication of monolithic 3D micro-systems

P. Preechaburana and D. Filippini, Lab Chip, 2011, 11, 288 DOI: 10.1039/C0LC00331J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements