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Issue 12, 2010
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Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties

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Abstract

Slope-tunable Si nanorod arrays (NRAs) were fabricated with colloidal lithography and reactive ion etching (RIE). Sharpened NRAs fabricated by increasing the SF6/O2 flow ratio during RIE exhibit enhanced antireflection (AR) and hydrophobic properties, which are attributed to the smooth gradient in the effective refractive index of NRAs, and the enlarged water/air interface of the water drops in the NRA layers, respectively. Enhanced AR characteristics via modifying the slope of NRAs are accompanied by broad-band working ranges, omnidirectionality, and polarization insensitivity. Detailed experimental and theoretical analysis of slope-tunable NRAs should benefit the development of various self-cleaning optoelectronic devices with efficient light management.

Graphical abstract: Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties

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Publication details

The article was received on 14 Jun 2010, accepted on 27 Jul 2010 and first published on 08 Oct 2010


Article type: Paper
DOI: 10.1039/C0NR00402B
Citation: Nanoscale, 2010,2, 2765-2768
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    Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties

    Y. Lin, K. Y. Lai, H. Wang and J. He, Nanoscale, 2010, 2, 2765
    DOI: 10.1039/C0NR00402B

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