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Issue 7, 2010
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Ex situ vapor phase boron doping of silicon nanowires using BBr3

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Abstract

An ex situ vapor phase technique for doping vapor–liquid–solid grown silicon nanowires (NWs) based on the reduction of BBr3 by H2 has been demonstrated. Electron microscope images show that the excellent crystal quality of the nanowires is preserved with minimal alteration of their surface morphology. Fano resonance in the Raman spectra for single nanowires indicates that active boron concentrations over two orders of magnitude and as high as 1020 cm−3 are achievable in a well-controlled manner, with excellent axial uniformity. Electrical resistance measurements from single nanowires confirm that incorporated boron is electrically active, and doping of epitaxial bridging Si NWs is successfully demonstrated. By avoiding the pitfalls of nonuniform concentration profiles and drastic morphological changes that often accompany in situ boron doping, this technique provides a valuable alternative doping route for the development of single Si NW devices in a reliable manner.

Graphical abstract: Ex situ vapor phase boron doping of silicon nanowires using BBr3

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Publication details

The article was received on 15 Feb 2010, accepted on 19 Mar 2010 and first published on 22 May 2010


Article type: Paper
DOI: 10.1039/C0NR00127A
Citation: Nanoscale, 2010,2, 1165-1170
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    Ex situ vapor phase boron doping of silicon nanowires using BBr3

    G. S. Doerk, G. Lestari, F. Liu, C. Carraro and R. Maboudian, Nanoscale, 2010, 2, 1165
    DOI: 10.1039/C0NR00127A

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