Jump to main content
Jump to site search


A high impact peer reviewed journal publishing experimental and theoretical work across the breadth of nanoscience and nanotechnology


Ex situ vapor phase boron doping of silicon nanowires using BBr3

Corresponding authors
Department of Chemical Engineering, University of California, Berkeley
E-mail: maboudia@berkeley.edu
Nanoscale, 2010,2, 1165-1170

DOI: 10.1039/C0NR00127A
Received 15 Feb 2010, Accepted 19 Mar 2010
First published online 22 May 2010

This article is part of themed collection: Doped nanostructures
Please wait while Download options loads
This may take some time to load.