Nanoscale

A high impact peer reviewed journal publishing experimental and theoretical work across the breadth of nanoscience and nanotechnology

Paper

Ex situ vapor phase boron doping of silicon nanowires using BBr3

*
Corresponding authors
a
Department of Chemical Engineering, University of California, Berkeley
E-mail: maboudia@berkeley.edu
Nanoscale, 2010,2, 1165-1170

DOI: 10.1039/C0NR00127A
Received 15 Feb 2010, Accepted 19 Mar 2010
First published online 22 May 2010

This article is part of themed collection: Doped nanostructures
Please wait while Download options loads
 
 
This may take some time to load.