Issue 36, 2010
From the journal:

Journal of Materials Chemistry

MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

Savio J. A. Moniz,a   Christopher S. Blackman,*a   Claire J. Carmalta  and  Geoffrey Hyetta  

* Corresponding authors

a Materials Chemistry Centre, Department of Chemistry, University College London, 20 Gordon Street, London, UK
E-mail: c.blackman@ucl.ac.uk
Tel: +44 (0)2076794703

Abstract

Bismuth(III) tert-butoxide [Bi(OtBu)3] was utilised as a single-source precursor to controllably deposit thin films of different phases of bismuth oxide (Bi2O3) on glass substrates via low-pressure chemical vapour deposition (LPCVD). Band gaps for the different phases have been measured (Eg = 2.3–3.0 eV) and the films displayed excellent photodegradation of water under near-UV irradiation.

Graphical abstract: MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

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Article information

DOI
https://doi.org/10.1039/C0JM01720E
Article type
Paper
Submitted
02 Jun 2010
Accepted
29 Jun 2010
First published
02 Aug 2010

J. Mater. Chem., 2010,20, 7881-7886

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MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

S. J. A. Moniz, C. S. Blackman, C. J. Carmalt and G. Hyett, J. Mater. Chem., 2010, 20, 7881 DOI: 10.1039/C0JM01720E

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