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Issue 48, 2010
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Subwavelength Si nanowire arrays for self-cleaning antireflection coatings

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Abstract

Galvanic wet etching was adopted to fabricate Si nanowire arrays (NWAs) as a near-perfect subwavelength structure (SWS), which is an optically effective gradient-index antireflection (AR) surface and also exhibits super-hydrophobicity with an extremely high water contact angle (159°). Fresnel reflection and diffuse reflection over the broad spectrum can be eliminated by a Si NWA AR coating. Moreover, Si NWA SWSs show polarization-independent and omnidirectional AR properties. The wavelength-averaged specular and diffuse reflectance of Si NWA SWSs are as low as 0.06% and 2.51%, respectively. The effects of the surface profile of this biomimetic SWS on the AR and super-hydrophobic properties were investigated systematically.

Graphical abstract: Subwavelength Si nanowire arrays for self-cleaning antireflection coatings

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Publication details

The article was received on 26 Feb 2010, accepted on 31 Aug 2010 and first published on 18 Oct 2010


Article type: Paper
DOI: 10.1039/C0JM00524J
Citation: J. Mater. Chem., 2010,20, 10924-10930
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    Subwavelength Si nanowire arrays for self-cleaning antireflection coatings

    Y. Dai, H. Chang, K. Lai, C. Lin, R. Chung, G. Lin and J. He, J. Mater. Chem., 2010, 20, 10924
    DOI: 10.1039/C0JM00524J

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