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Issue 24, 2010
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A simple and scalable route to wafer-size patterned graphene

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Abstract

Producing large-scale graphene films with controllable patterns is an essential component of graphene-based nanodevice fabrication. Current methods of graphene pattern preparation involve either high cost, low throughput patterning processes or sophisticated instruments, hindering their large-scale fabrication and practical applications. We report a simple, effective, and reproducible approach for patterning graphene films with controllable feature sizes and shapes. The patterns were generated using a versatile photocoupling chemistry. Features from micrometres to centimetres were fabricated using a conventional photolithography process. This method is simple, general, and applicable to a wide range of substrates including silicon wafers, glass slides, and metal films.

Graphical abstract: A simple and scalable route to wafer-size patterned graphene

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Publication details

The article was received on 25 Feb 2010, accepted on 23 Mar 2010 and first published on 17 May 2010


Article type: Paper
DOI: 10.1039/C0JM00509F
Citation: J. Mater. Chem., 2010,20, 5041-5046
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    A simple and scalable route to wafer-size patterned graphene

    L. Liu, G. Zorn, D. G. Castner, R. Solanki, M. M. Lerner and M. Yan., J. Mater. Chem., 2010, 20, 5041
    DOI: 10.1039/C0JM00509F

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