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Issue 36, 2010
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MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

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Abstract

Bismuth(III) tert-butoxide [Bi(OtBu)3] was utilised as a single-source precursor to controllably deposit thin films of different phases of bismuth oxide (Bi2O3) on glass substrates via low-pressure chemical vapour deposition (LPCVD). Band gaps for the different phases have been measured (Eg = 2.3–3.0 eV) and the films displayed excellent photodegradation of water under near-UV irradiation.

Graphical abstract: MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

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Publication details

The article was received on 02 Jun 2010, accepted on 29 Jun 2010 and first published on 02 Aug 2010


Article type: Paper
DOI: 10.1039/C0JM01720E
Citation: J. Mater. Chem., 2010,20, 7881-7886
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    MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

    S. J. A. Moniz, C. S. Blackman, C. J. Carmalt and G. Hyett, J. Mater. Chem., 2010, 20, 7881
    DOI: 10.1039/C0JM01720E

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