MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

Savio J. A. Moniz; Christopher S. Blackman; Claire J. Carmalt; Geoffrey Hyett

doi:10.1039/C0JM01720E

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Journal of Materials Chemistry

Issue 36, 2010

Journal of Materials Chemistry was published between 1991 and 2012. From issue 1, 2013, it was replaced by three new journals: Journal of Materials Chemistry A, B and C

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MOCVD of crystalline Bi₂O₃ thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

Savio J. A. Moniz,^a Christopher S. Blackman,*^a Claire J. Carmalt^a and Geoffrey Hyett^a

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Materials Chemistry Centre, Department of Chemistry, University College London, 20 Gordon Street, London, UK
E-mail: c.blackman@ucl.ac.uk ;
Tel: +44 (0)2076794703

J. Mater. Chem., 2010,20, 7881-7886

DOI: 10.1039/C0JM01720E
Received 02 Jun 2010, Accepted 29 Jun 2010
First published online 02 Aug 2010

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Abstract
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Bismuth(III) tert-butoxide [Bi(O^tBu)₃] was utilised as a single-source precursor to controllably deposit thin films of different phases of bismuth oxide (Bi₂O₃) on glass substrates via low-pressure chemical vapour deposition (LPCVD). Band gaps for the different phases have been measured (E_g = 2.3–3.0 eV) and the films displayed excellent photodegradation of water under near-UV irradiation.

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MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

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MOCVD of crystalline Bi₂O₃ thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water