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Issue 48, 2010
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Deposition of thin films of organic–inorganic hybrid materials based on aromatic carboxylic acids by atomic layer deposition

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Abstract

Thin films of organic–inorganic hybrid materials have been grown by the atomic layer deposition (ALD) technique, using trimethylaluminium (TMA) and aromatic carboxylic acids such as 1,2-benzene dicarboxylic acid, 1,3-benzene dicarboxylic acid, 1,4-benzene dicarboxylic acid, 1,3,5-benzene tricarboxylic acid, 1,2,4,5-benzene tetracarboxylic acid as precursors. Growth rates as function of temperature show that all systems, with the exception of the benzoic acidTMA system, possess ALD-windows and provides growth rates in the range of 0.25–1.34 nm/cycle. X-ray diffraction studies of the as-deposited films reveal their amorphous character, which is also supported by very low surface roughness as measured by atomic force microscopy. As-deposited films were investigated by Fourier Transform Infrared Spectroscopy proving that the deposited films are of a hybrid character.

Graphical abstract: Deposition of thin films of organic–inorganic hybrid materials based on aromatic carboxylic acids by atomic layer deposition

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Publication details

The article was received on 09 Jul 2010, accepted on 17 Sep 2010 and first published on 01 Nov 2010


Article type: Paper
DOI: 10.1039/C0DT00817F
Citation: Dalton Trans., 2010,39, 11628-11635
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    Deposition of thin films of organic–inorganic hybrid materials based on aromatic carboxylic acids by atomic layer deposition

    K. B. Klepper, O. Nilsen and H. Fjellvåg, Dalton Trans., 2010, 39, 11628
    DOI: 10.1039/C0DT00817F

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