Jump to main content
Jump to site search

Issue 25, 2010
Previous Article Next Article

Competition between hydrogen bond and halogen bond in complexes of formaldehyde with hypohalous acids

Author affiliations

Abstract

An ab initio study of the complexes formed by hypohalous acids (HOX, X = F, Cl and Br) with formaldehyde has been carried out at the MP2/aug-cc-pVTZ computational level. Two minima complexes are found, one with an H⋯O contact and the other one with an X⋯O contact. The former is more stable than the latter, and the strength difference between them decreases as the size of the X atom increases. The associated HO and XO bonds undergo a bond lengthening and red shift, whereas a blue shift was observed in the bond of the hypohalous acid not involved in the interaction. The interaction strength and properties in both complexes are analyzed with atoms in molecules (AIM) and natural bond orbital (NBO) theories. The energy decomposition analyses indicate that the contribution from the electrostatic interaction energy is larger in the hydrogen-bonded complexes than that in the halogen-bonded complexes.

Graphical abstract: Competition between hydrogen bond and halogen bond in complexes of formaldehyde with hypohalous acids

Back to tab navigation

Publication details

The article was received on 14 Dec 2009, accepted on 17 Mar 2010 and first published on 11 May 2010


Article type: Paper
DOI: 10.1039/B926355A
Citation: Phys. Chem. Chem. Phys., 2010,12, 6837-6843
  •   Request permissions

    Competition between hydrogen bond and halogen bond in complexes of formaldehyde with hypohalous acids

    Q. Li, X. Xu, T. Liu, B. Jing, W. Li, J. Cheng, B. Gong and J. Sun, Phys. Chem. Chem. Phys., 2010, 12, 6837
    DOI: 10.1039/B926355A

Search articles by author

Spotlight

Advertisements