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Paper

Viable route for switching of an engineered silica surface using Cu2+ ions at sub-ppm levels

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Corresponding authors
a
Dipartimento di Scienze Chimiche, Università di Catania, Viale Andrea Doria 6, Catania, Italy
b
I.N.S.T.M. UdR of Catania, Viale Andrea Doria 6, Catania, Italy
E-mail: agulino@dipchi.unict.it
Analyst, 2010,135, 2273-2279

DOI: 10.1039/C0AN00364F
Received 31 May 2010, Accepted 05 Jul 2010
First published online 02 Aug 2010

This article is part of themed collection: Highlighting analytical science in France, Italy and Spain
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