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Issue 1, 2009
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Patterned polyaniline & carbon nanotube–polyaniline composites on silicon

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Abstract

Atomic force anodisation lithography has been used to create patterned silicon oxide nanostructures on a p-type silicon (100) substrate. Modification of these oxide nanostructures either by acid treatment or self assembly of 3-aminopropyltriethoxysilane yields a chemically heterogeneous surface containing hydrophilic and hydrophobic regions allowing the site-selective deposition of thin films of conductive polyaniline. Carbon nanotubes, with high carboxylic acid functionality, were immobilised on the patterned hydrophilic regions using condensation reactions. Due to the hydrophobic nature of the nanotube sidewalls polyaniline is found to adsorb to the carbon nanotube structure and has allowed the creation of patterned carbon nanotube–polyaniline composites. Such composite materials may prove to be useful in the field of molecular electronics. These two approaches allow the construction of what are basically positive and negative resists using polymers.

Graphical abstract: Patterned polyaniline & carbon nanotube–polyaniline composites on silicon

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Publication details

The article was received on 06 Jun 2008, accepted on 18 Sep 2008 and first published on 24 Oct 2008


Article type: Paper
DOI: 10.1039/B809609K
Citation: Soft Matter, 2009,5, 164-172
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    Patterned polyaniline & carbon nanotube–polyaniline composites on silicon

    B. S. Flavel, J. Yu, J. G. Shapter and J. S. Quinton, Soft Matter, 2009, 5, 164
    DOI: 10.1039/B809609K

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