Complex three-dimensional conformal surfaces formed by atomic layer deposition: computation and experimental verification

Andrew Brzezinski; Ying-Chieh Chen; Pierre Wiltzius; Paul V. Braun

doi:10.1039/B914318A

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Journal of Materials Chemistry

Issue 48, 2009

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Complex three-dimensional conformal surfaces formed by atomic layer deposition: computation and experimental verification

Andrew Brzezinski , Ying-Chieh Chen , Pierre Wiltzius and Paul V. Braun

J. Mater. Chem., 2009, 19, 9126-9130

DOI: 10.1039/B914318A
Received 16 Jul 2009, Accepted 30 Sep 2009
First published on the web 06 Nov 2009

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Abstract
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Atomic layer deposition in complex three-dimensional porous materials is useful for manipulating properties such as pore size, pore connectivity, density, and dielectric constant. In order to calculate a material's properties it is necessary to determine the material distribution. A generally applicable algorithm for determining the material distribution and pore connectivity is presented. Calculations using the algorithm compared favorably with experimental results for the important case of infilling dielectric material into three-dimensional photonic crystal templates.

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Scaling, error, and algorithmic details
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Journal of Materials Chemistry

Complex three-dimensional conformal surfaces formed by atomic layer deposition: computation and experimental verification

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