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Issue 10, 2009
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Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film

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Abstract

A novel combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) technique was used to synthesise numerous vanadium oxide and vanadium oxynitride phases on a single film. This is the first example of cAPCVD having been used to synthesise a gradating mixed anion system. The film was characterised by X-ray diffraction (XRD) mapping, Raman, wavelength dispersive X-ray analysis (WDX) and X-ray photoelectron spectroscopy (XPS) analysis of positions along the film's front edge allowed the chemical composition to be determined and correlated with XRD data. Film thicknesses were determined using side-on scanning electron microscopy (SEM). Functional property mapping of the optical transmittance/reflectance and electrical resistance allowed systematic investigation on the effects of oxygen content within a vanadium oxynitride film. cAPCVD used in conjunction with mapping analysis tools is a shortcut for identifying numerous, phases, compositions and properties and their relationships on a single film, and offers a rapid method for analysis of phase-space.

Graphical abstract: Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film

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Publication details

The article was received on 03 Oct 2008, accepted on 04 Dec 2008 and first published on 28 Jan 2009


Article type: Paper
DOI: 10.1039/B817429F
Citation: J. Mater. Chem., 2009,19, 1399-1408
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    Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film

    A. Kafizas, G. Hyett and I. P. Parkin, J. Mater. Chem., 2009, 19, 1399
    DOI: 10.1039/B817429F

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