Non-ionic photo-acid generators for applications in two-photon lithography

Lorenz Steidl; Shalin J. Jhaveri; Ramakrishnan Ayothi; Jing Sha; Jesse D. McMullen; Sin Yee Cindy Ng; Warren R. Zipfel; Rudolf Zentel; Christopher K. Ober

doi:10.1039/B816434G

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Journal of Materials Chemistry

Issue 4, 2009

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Non-ionic photo-acid generators for applications in two-photon lithography

Lorenz Steidl , Shalin J. Jhaveri , Ramakrishnan Ayothi , Jing Sha , Jesse D. McMullen , Sin Yee Cindy Ng , Warren R. Zipfel , Rudolf Zentel and Christopher K. Ober

J. Mater. Chem., 2009, 19, 505-513

DOI: 10.1039/B816434G
Received 19 Sep 2008, Accepted 30 Oct 2008
First published on the web 08 Dec 2008

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Abstract
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Non-ionic photoacid generators (PAGs) have been designed and synthesized for use in two-photon lithography (TPL). The chromophores in these new PAGs are covalently linked to the photocleavable group by a flexible joint. Their thermal stability, solubility and efficiency to produce acid under both one- and two-photon excitation were characterized. The potential of these PAGs for TPL was tested in two negative-tone resist systems relying on different mechanisms: free-radical/cationic polymerization or a cationically initiated cross-linking reaction. These PAGs needed lower threshold power for polymerization compared to a commercially available photoinitiator, isopropylthioxanthone, and a photoacid generator, N-hydroxynaphthalimide triflate. Microstructures with a resolution of 0.6 µm were fabricated and the threshold power for polymerization was found to be below 2 mW.

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Supplementary Info

NMR spectra of the prepared PAGs and UV-Vis, as well as FT-IRspectra of the detection of photoacid formation in solution andpolymer film
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Articles By

Lorenz Steidl
Shalin J. Jhaveri
Ramakrishnan Ayothi
Jing Sha
Jesse D. McMullen
Sin Yee Cindy Ng
Warren R. Zipfel
Rudolf Zentel
Christopher K. Ober

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Journal of Materials Chemistry

Non-ionic photo-acid generators for applications in two-photon lithography

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