Accessibility of cylindrical channels within patterned mesoporous silica films using nanoparticle diffusion

Hung-Ting Chen; Todd A. Crosby; Myoung-Hwan Park; Sivakumar Nagarajan; Vincent M. Rotello; James J. Watkins

doi:10.1039/B815055A

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Journal of Materials Chemistry

Issue 1, 2009

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Accessibility of cylindrical channels within patterned mesoporous silica films using nanoparticle diffusion

Hung-Ting Chen , Todd A. Crosby , Myoung-Hwan Park , Sivakumar Nagarajan , Vincent M. Rotello and James J. Watkins

J. Mater. Chem., 2009, 19, 70-74

DOI: 10.1039/B815055A
Received 28 Aug 2008, Accepted 02 Oct 2008
First published on the web 12 Nov 2008

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Abstract
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Mesoporous silica films with well ordered nanochannels (approximately 7 nm in diameter) oriented parallel to the substrate were synthesized using supercritical carbon dioxide mediated silica deposition within templates comprised of triblock copolymers blended with strongly associating homopolymers. The films were patterned at the device level by conventional lithography and etched to yield periodic circular features approximately 20 µm in diameter. The nanoscale channels remained accessible to penetrant diffusion as shown by dye uptake experiments. The nanochannel arrays were used as miniature size exclusion columns to mediate nanoparticle diffusion.

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Hung-Ting Chen
Todd A. Crosby
Myoung-Hwan Park
Sivakumar Nagarajan
Vincent M. Rotello
James J. Watkins

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Journal of Materials Chemistry

Accessibility of cylindrical channels within patterned mesoporous silica films using nanoparticle diffusion

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