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Potential analytical applications of negative ions from a pulsed radiofrequency glow discharge in argon

Corresponding authors
EMPA Materials Science and Technology, Feuerwerkerstr. 39, Thun, Switzerland
Tofwerk AG, Uttigenstrasse 22, Thun, Switzerland
J. Anal. At. Spectrom., 2009,24, 178-180

DOI: 10.1039/B818954D
Received 27 Oct 2008, Accepted 16 Dec 2008
First published online 24 Dec 2008
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