Issue 4, 2009
From the journal:

Chemical Communications

Heteropolyacid-assisted fabrication of carbon nanostructures under ambient conditions†

Zhenhui Kang,*abc   Yang Liu,abc   Chi Him A. Tsang,bd   Dorothy Duo Duo Ma,bc   Enbo Wange  and  Shuit-Tong Lee*bc  

* Corresponding authors

a Functional Nano & Soft Materials Laboratory (FUNSOM), Soochow University, Suzhou, China
E-mail: zhkang@suda.edu.cn

b Center of Super-Diamond and Advanced Films (COSADF), City University of Hong Kong, Hong Kong SAR, China
E-mail: apannale@cityu.edu.hk

c Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China

d Department of Biology and Chemistry, City University of Hong Kong, Hong Kong SAR, China

e Department of Chemistry, Northeast Normal University, Changchun, Jilin, China

Abstract

Under ambient conditions, H3PW12O40-assisted electrochemical reduction process for chemical synthesis of SWNT–CNS, and H3PMo12O40-assisted ball milling process for COS fabrication.

Graphical abstract: Heteropolyacid-assisted fabrication of carbon nanostructures under ambient conditions

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/B812573B
Article type
Communication
Submitted
25 Jul 2008
Accepted
01 Dec 2008
First published
15 Dec 2008

Chem. Commun., 2009, 413-415

Permissions

Request permissions

Heteropolyacid-assisted fabrication of carbon nanostructures under ambient conditions

Z. Kang, Y. Liu, C. H. A. Tsang, D. D. D. Ma, E. Wang and S. Lee, Chem. Commun., 2009, 413 DOI: 10.1039/B812573B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements