Self-assembled nanostructures from homopolymer induced by UV and solvent exposure

Sailaja Chada; Mingdi Yan

doi:10.1039/B807328G

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Soft Matter

Issue 11, 2008

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Self-assembled nanostructures from homopolymer induced by UV and solvent exposure

Sailaja Chada and Mingdi Yan

Soft Matter, 2008, 4, 2164-2167

DOI: 10.1039/B807328G
Received 30 Apr 2008, Accepted 13 Aug 2008
First published on the web 27 Aug 2008

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Abstract
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Compounds
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A simple method for creating self-assembled nanostructures using a single polymer system is reported. When spin-coated polystyrene thin films were irradiated with UV light and treated with toluene, unique nanostructures were observed, evolving from star-shaped networks to arrays of concentric circles. The nanostructure formation is a result of differential responses of crosslinked and oxidized products to the solvent by a combined effect of phase separation and solvent swelling. The nanostructures were observed for polymers of different molecular weights, films of different thicknesses, and on various substrates.

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Supplementary Info

Experimental details, optical image of UV irradiated PS film treated with acetonitrile and toluene, optical images of the structures formed on glass, ODTMS, mica and NaCl disc
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Soft Matter

Self-assembled nanostructures from homopolymer induced by UV and solvent exposure

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