Maskless photolithography using UV LEDs

Rosanne M. Guijt; Michael C. Breadmore

doi:10.1039/B800465J

Maskless photolithography using UV LEDs

Rosanne M. Guijt*^a and Michael C. Breadmore^a

* Corresponding authors

^a Australian Centre for Research on Separation Science, Private Bag 75, Hobart, Australia
E-mail: Rosanne.Guijt@utas.edu.au
Fax: +61 3 6226 2858
Tel: +61 3 62262171

Abstract

A UV light emitting diode (LED) with a maximum output of 372 nm was collimated using a pinhole and a small plastic tube and focused using a microscope objective onto a substrate for direct lithographic patterning of the photoresist. Movement of the substrate with a motorised linear stage (syringe pump) allowed lines in SU-8 to be pattered with a width down to 35 μm at a linear velocity of 80 μm s⁻¹, while in the dry film resist Ordyl SY 330, features as narrow as 17 μm were made at a linear velocity of 245 μm s⁻¹. At this linear velocity, a 75 mm long feature could be patterned in 5 min. Functional microfluidic devices were made by casting PDMS on a master made by LED lithography. The results show that UV LEDs are a suitable light source for direct writing lithography, offering a budget friendly, and high resolution alternative for rapid prototyping of features smaller than 20 μm.

Supplementary files

Publication details

The article was received on 11 Jan 2008, accepted on 12 May 2008 and first published on 23 Jun 2008

Article type: Technical Note

DOI: 10.1039/B800465J

Citation: Lab Chip, 2008,8, 1402-1404

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Maskless photolithography using UV LEDs

R. M. Guijt and M. C. Breadmore, Lab Chip, 2008, 8, 1402
DOI: 10.1039/B800465J
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Lab on a Chip

Maskless photolithography using UV LEDs

Abstract

Supplementary files

Publication details

Maskless photolithography using UV LEDs

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