Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

Wouter Sparreboom; Jan C. T. Eijkel; Johan Bomer; Albert van den Berg

doi:10.1039/B716382G

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Lab on a Chip

Issue 3, 2008

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Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

Wouter Sparreboom , Jan C. T. Eijkel , Johan Bomer and Albert van den Berg

Lab Chip, 2008, 8, 402-407

DOI: 10.1039/B716382G
Received 24 Oct 2007, Accepted 14 Dec 2007
First published on the web 15 Jan 2008

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We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.

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