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Paper

Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

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BIOS, the Lab-on-a-chip Group, MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, AE, The Netherlands
E-mail: a.vandenberg@ewi.utwente.nl;
Fax: +31 534892287 ;
Tel: +31 534892691
Lab Chip, 2008,8, 402-407

DOI: 10.1039/B716382G
Received 24 Oct 2007, Accepted 14 Dec 2007
First published online 15 Jan 2008
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