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Issue 3, 2008
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Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

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Abstract

We present a rapid etch method to surface-micromachine nanochannels with integrated noble metal electrodes using a single metal sacrificial layer. The method is based on the galvanic coupling of a chromium sacrificial layer with gold electrodes, which results in a 10-fold increase in etch rate with respect to conventional single metal etching. The etch process is investigated and characterized by optical and electrochemical measurements, leading to a theoretical explanation of the observed etch rate based on mass transport. Using this explanation we derive some generic design rules for nanochannel fabrication employing sacrificial metal etching.

Graphical abstract: Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

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Publication details

The article was received on 24 Oct 2007, accepted on 14 Dec 2007 and first published on 15 Jan 2008


Article type: Paper
DOI: 10.1039/B716382G
Citation: Lab Chip, 2008,8, 402-407
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    Rapid sacrificial layer etching for the fabrication of nanochannels with integrated metal electrodes

    W. Sparreboom, J. C. T. Eijkel, J. Bomer and A. van den Berg, Lab Chip, 2008, 8, 402
    DOI: 10.1039/B716382G

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