Poly(glycidyl methacrylate)s with controlled molecular weights as low-shrinkage resins for 3D multibeam interference lithography

Ali Hayek; Yongan Xu; Takashi Okada; Stephen Barlow; Xuelian Zhu; Jun Hyuk Moon; Seth R. Marder; Shu Yang

doi:10.1039/B809656B

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Journal of Materials Chemistry

Issue 28, 2008

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Poly(glycidyl methacrylate)s with controlled molecular weights as low-shrinkage resins for 3D multibeam interference lithography

Ali Hayek , Yongan Xu , Takashi Okada , Stephen Barlow , Xuelian Zhu , Jun Hyuk Moon , Seth R. Marder and Shu Yang

J. Mater. Chem., 2008, 18, 3316-3318

DOI: 10.1039/B809656B
Received 09 Jun 2008, Accepted 12 Jun 2008
First published on the web 20 Jun 2008

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Abstract
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Poly(glycidyl methacrylate) has been shown to be a useful material for fabrication of photonic crystal templates using multibeam interference lithography, since it exhibits lower shrinkage than conventional SU8.

Supplementary Info

Details of synthesis and characterization for thepoly(glycidylmethacrylate)s, details of diamond-like structurefabrication, and details of determination of epoxy cross-linkingusing IR spectroscopy
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Articles By

Ali Hayek
Yongan Xu
Takashi Okada
Stephen Barlow
Xuelian Zhu
Jun Hyuk Moon
Seth R. Marder
Shu Yang

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Journal of Materials Chemistry

Poly(glycidyl methacrylate)s with controlled molecular weights as low-shrinkage resins for 3D multibeam interference lithography

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