Dry photolithographic patterning process for organic electronic devices using supercritical carbon dioxide as a solvent

Ha Soo Hwang; Alexander A. Zakhidov; Jin-Kyun Lee; Xavier André; John A. DeFranco; Hon Hang Fong; Andrew B. Holmes; George G. Malliaras; Christopher K. Ober

doi:10.1039/B802713G

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Journal of Materials Chemistry

Issue 26, 2008

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Dry photolithographic patterning process for organic electronic devices using supercritical carbon dioxide as a solvent

Ha Soo Hwang , Alexander A. Zakhidov , Jin-Kyun Lee , Xavier André , John A. DeFranco , Hon Hang Fong , Andrew B. Holmes , George G. Malliaras and Christopher K. Ober

J. Mater. Chem., 2008, 18, 3087-3090

DOI: 10.1039/B802713G
Received 18 Feb 2008, Accepted 04 Apr 2008
First published on the web 21 Apr 2008

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Abstract
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The particular challenge of micropatterning organic materials has stimulated numerous approaches for making effective and repeatable patterned structures with fine features. Among all the micropatterning techniques photolithography, being the preferred method for the inorganic semiconductor industry, did not create much impact due to its incompatibility with the majority of organic electronic materials. Here we introduce a novel, chemically benign approach to dry photolithographic patterning of organic materials using super-critical carbon dioxide (scCO₂) as a green developing solvent. We illustrate the possible applications of the new technique by patterning conducting polymers and light emitting polymers for organic light emitting diodes.

Articles By

Ha Soo Hwang
Alexander A. Zakhidov
Jin-Kyun Lee
Xavier André
John A. DeFranco
Hon Hang Fong
Andrew B. Holmes
George G. Malliaras
Christopher K. Ober

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Journal of Materials Chemistry

Dry photolithographic patterning process for organic electronic devices using supercritical carbon dioxide as a solvent

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