Advanced cyclopentadienyl precursors for atomic layer deposition of ZrO2 thin films
Abstract
ZrO2 thin films were grown onto silicon (100) substrates by
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* Corresponding authors
a
Department of Chemistry, University of Helsinki, University of Helsinki, P.O. Box 55, Finland
E-mail:
Jaakko.Niinisto@helsinki.fi
b University of Tartu, Institute of Experimental Physics and Technology, Tähe 4, Tartu, Estonia
c Beneq OY, Ensimmäinen savu, Vantaa, Finland
d Picosun USA, LLC, 719 Griswold Street, Suite 820, Detroit, Michigan, USA
e Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O. Box 6100, Espoo, Finland
f Ångström Microstructure Laboratory, Department of Engineering Sciences, Uppsala University, Box 534, Uppsala, Sweden
g SAFC Hitech, Power Road, Bromborough, Wirral, Merseyside, UK
ZrO2 thin films were grown onto silicon (100) substrates by
J. Niinistö, K. Kukli, A. Tamm, M. Putkonen, C. L. Dezelah, L. Niinistö, J. Lu, F. Song, P. Williams, P. N. Heys, M. Ritala and M. Leskelä, J. Mater. Chem., 2008, 18, 3385 DOI: 10.1039/B802523A
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