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Issue 11, 2008
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Evolution of non-ionic surfactant-templated silicate films at the air–liquid interface

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Abstract

Spontaneous growth of non-ionic surfactant-templated thin films at the air–water interface was investigated using three techniques: Brewster angle microscopy (BAM), time-resolved off-specular X-ray reflectivity and grazing incidence X-ray diffraction (GIXD). Experiments were also carried out to study the evolution of micelles in the subphase solution using small-angle neutron scattering (SANS). Films were prepared in acidic conditions using octaethylene glycol mono-n-hexadecyl ether (C16EO8) as the surfactant and tetramethyloxysilane (TMOS) as the silica precursor. Three different TMOS–C16EO8 molar ratios (3.5, 7.1 and 10.8) were studied. Variation of the silica-precursor concentration causes a significant effect on the film-formation time, the solution and film-growth mechanisms and the final film structure.

Graphical abstract: Evolution of non-ionic surfactant-templated silicate films at the air–liquid interface

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Publication details

The article was received on 29 Oct 2007, accepted on 04 Jan 2008 and first published on 24 Jan 2008


Article type: Paper
DOI: 10.1039/B716662A
Citation: J. Mater. Chem., 2008,18, 1222-1231
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    Evolution of non-ionic surfactant-templated silicate films at the air–liquid interface

    C. Fernandez-Martin, S. J. Roser and K. J. Edler, J. Mater. Chem., 2008, 18, 1222
    DOI: 10.1039/B716662A

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