Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocenezirconium and hafnium precursors†
Abstract
Thin films of ZrO2 and HfO2 have been deposited by liquid injection
* Corresponding authors
a Department of Materials Science and Engineering, University of Liverpool, Liverpool, UK
b
Department of Chemistry, University of Liverpool, Liverpool, UK
E-mail:
hca@liv.ac.uk, tjconsultancy@btconnect.com
c Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool, UK
d Tyndall National Institute, Lee Maltings, Cork, Ireland
e SAFC Hitech, Power Road, Bromborough, Wirral, UK
Thin films of ZrO2 and HfO2 have been deposited by liquid injection
K. Black, H. C. Aspinall, A. C. Jones, K. Przybylak, J. Bacsa, P. R. Chalker, S. Taylor, C. Z. Zhao, S. D. Elliott, A. Zydor and P. N. Heys, J. Mater. Chem., 2008, 18, 4561 DOI: 10.1039/B807205A
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